p-Hpara-hydroxystyrene

　　Main Applications

　　Functional Polymer Material Monomers:

　　Poly(p-hydroxystyrene) (PHS) is a key raw material for photoresists, especially in semiconductor manufacturing. After chemical modification, PHS can serve as the base material for ultraviolet photoresists, featuring high resolution and etch resistance.

　　Used to prepare ion exchange resins and adsorption resins (utilizing the polar adsorption of polar molecules by phenolic hydroxyl groups).

　　Organic Synthesis Intermediates:

　　Used to synthesize pharmaceutical and agrochemical intermediates (such as antimicrobial agents and anti-inflammatory drug precursors).

　　Functional monomers are generated via esterification or alkylation reactions for the preparation of coatings and adhesives (enhancing adhesion to polar substrates).

　　Other Applications:

　　Used as a crosslinking agent for polymer modification; reacting phenolic hydroxyl groups with isocyanates, epoxy resins, etc., to improve the mechanical properties and chemical resistance of materials.

　　Used to prepare fluorescent probes and sensors (utilizing the recognition ability of phenolic hydroxyl groups for metal ions).

CAS NO: 2628-17-3

EC NO: 220-103-6

Molecular Formula: C₈H₈O

Molecular Weight: 120.15

Aliases: 4-Hydroxystyrene; 4-Vinylphenol; p-Hydroxystyrene;

Structural Formula: