p-Hydroxystyrene

　　Main Applications

　　Functional Polymer Material Monomers:

　　Poly(p-hydroxystyrene) (PHS) is a key raw material for photoresists, especially in semiconductor manufacturing. After chemical modification, PHS can serve as the base material for ultraviolet photoresists, featuring high resolution and etch resistance.

　　Used for preparing ion exchange resins and adsorption resins (utilizing the polar adsorption of polar molecules by phenolic hydroxyl groups).

　　Organic Synthesis Intermediates:

　　Used for synthesizing pharmaceutical and agrochemical intermediates (such as antibacterial agents and anti-inflammatory drug precursors).

　　Functional monomers are generated via esterification or alkylation reactions for the preparation of coatings and adhesives (enhancing adhesion to polar substrates).

　　Other Applications:

　　Used as a crosslinking agent for polymer modification; reacting with isocyanates, epoxy resins, etc., via phenolic hydroxyl groups to improve the mechanical properties and chemical resistance of materials.

　　Used for preparing fluorescent probes and sensors (utilizing the recognition ability of phenolic hydroxyl groups for metal ions).