HYDRON® SE 220 Semiconductor Cleaning Solution

HYDRON® SE 220
A pH-neutral flux cleaning solution specifically designed for semiconductor electronics
Flux Remover
HYDRON® SE 220 is a water-based, single-phase cleaning solution specifically designed for immersion cleaning processes. It effectively removes flux residues from various semiconductor electronic devices such as lead frames after die attachment, discrete devices, power modules, and power LEDs. It also delivers excellent cleaning results for flip-chip, CMOS, and other devices.

Advantages over other cleaning solutions:

Due to its unique single-phase formulation, HYDRON® SE 220 provides superior cleaning results in immersion processes. It can be easily rinsed with deionized water without leaving any residue.
The product is pH-neutral, offering broad material compatibility, and particularly avoids damaging the passivation layer on chip surfaces.
HYDRON® SE 220 delivers a clean, activated copper surface that remains in an ideal state for a short period, preparing it for subsequent processes such as bonding, molding, and adhesion.
HYDRON® SE 220 has no flash point, making it suitable for use in immersion cleaning equipment without requiring explosion-proof protection.
Halogen-free and low odor.
Application Areas
Contaminant Removal
Cleaning Process
Cleaning Technology
Power Electronics Cleaning
SiP Package Cleaning
Wafer-Level Package Cleaning
MEMS Device Package Cleaning
Camera Module Cleaning

Shenzhen Junji Ruixiang Technology Co., Ltd.

Mr. Zeng 13902983965 (same number for WeChat)

Email: zengken@sz-cksc.com

Website: www.sz-cksc.com

Address: Room 1807, Oriental Plaza, Jianshe Road, Nanhu Street, Luohu District, Shenzhen